DOE Fusion Energy Sciences Workshop Report: “Plasma Science for Microelectronics Nanofabrication”

Low temperature plasmas are essential to the manufacture of devices in the semiconductor industry, from the creation of extreme ultraviolet photons used in the most advanced lithography to thin film etching, deposition, and surface modifications. The Department of Energy Office of Science Fusion Energy Sciences (FES) held a workshop titled Plasma Science for Microelectronics Nanofabrication in August 2022 to discuss the plasma science challenges and technical barriers needing to be overcome to continue to develop the innovative plasma technologies required to maintain and improve the internationally competitive US semiconductor industry. The report from that workshop can be downloaded here.

• Workshop Chair: Prof. David Graves, Princeton University (dgraves@pppl.gov)
• Co-Chairs:
  • Dr. Cathy Labelle (catherine.labelle@intel.com)
  • Prof. Mark J. Kushner (mjkush@umich.edu)
• DOE Sponsor: Dr. Nirmol Podder (Nirmol.Podder@science.doe.gov)